The　rubrene　(5,　6,　11,　12-tetraphenylnaphthacene)　films　were　deposited　by　vacuum　evaporation　on　Si　substrates.　The　impacts　of　the　deposition　conditions,　such　as　the　pressure,　evaporation　temperature,　and　deposition　time,　on　microstructures　and　properties　of　the　small　molecule,　semiconductor,　organic　rubrene　films　were　evaluated.　The　surface　morphologies　of　the　rubrene　films　were　characterized　with　optical　microscope　and　multimode　atomic　force　microscopy.　The　results　show　that　the　vacuum　evaporation　time　strongly　affects　the　microstructures　of　the　rubrene　films.　For　example,　after　vacuum　evaporation　at　100~110°C　for　7~8　h,　the　rubrene　films　were　found　to　be　polycrystalline.　The　growth　of　polycrystalline　rubrene　started　only　after　a　certain　thickness　of　the　amorphous　rubrene　films　formed　at　the　initial　stage　on　the　Si　substrate.