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Author:

Li, Hailiang (Li, Hailiang.) | Wu, Jian (Wu, Jian.) | Zhu, Xiaoli (Zhu, Xiaoli.) | Xie, Changqing (Xie, Changqing.) | Liu, Ming (Liu, Ming.) | Cao, Leifeng (Cao, Leifeng.)

Indexed by:

EI PKU CSCD

Abstract:

Within the limit of fabricating techniques, 2000 l/mm self-standing transmission gratings model was designed. And by combining the techniques of electronic-beam lithography and X-ray lithography, the 2000 l/mm X-ray self-standing transmission gratings was fabricated. Firstly, the electronic-beam lithography and micro-electroplating technology was used to prepare a master mask of gratings on polyimide membrane substrate. Then by using X-ray lithography and micro-electroplating, child gratings was replicated on the master mask. And the self-standing graph was transferred to the daughter gratings via utraviolet (U-V) lithography and micro-electroplating. Finally, with the technology of etching and inductively coupled plasma (ICP), the fabrication of X-ray self-standing transmission gratings was fulfilled. From the fabrication results of the gratings, it shows that bars smoothness, the absent ratio and the profile of the gratings are all desired.

Keyword:

Etching Inductively coupled plasma Fabrication Electroplating Transmissions X rays Substrates X ray lithography

Author Community:

  • [ 1 ] [Li, Hailiang]Key Lab of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • [ 2 ] [Li, Hailiang]Institute of Laser Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 3 ] [Wu, Jian]Institute of Laser Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 4 ] [Zhu, Xiaoli]Key Lab of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • [ 5 ] [Xie, Changqing]Key Lab of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • [ 6 ] [Liu, Ming]Key Lab of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • [ 7 ] [Cao, Leifeng]Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, Sichuan 621900, China

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Source :

Acta Optica Sinica

ISSN: 0253-2239

Year: 2009

Issue: 10

Volume: 29

Page: 2650-2655

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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