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Author:

Liu, Bo (Liu, Bo.) (Scholars:刘博) | Hong, Ming-Chun (Hong, Ming-Chun.) | Sahoo, Mamina (Sahoo, Mamina.) | Ong, Bin Leong (Ong, Bin Leong.) | Tok, Eng Soon (Tok, Eng Soon.) | Di, MengFu (Di, MengFu.) | Ho, Yu-Ping (Ho, Yu-Ping.) | Liang, Hanyuan (Liang, Hanyuan.) | Bow, Jong-Shing (Bow, Jong-Shing.) | Liu, Zhiwei (Liu, Zhiwei.) | Wang, Jer-Chyi (Wang, Jer-Chyi.) | Hou, Tuo-Hung (Hou, Tuo-Hung.) | Lai, Chao-Sung (Lai, Chao-Sung.)

Indexed by:

EI Scopus SCIE

Abstract:

Exploring brain-inspired synaptic devices has recently become a new focus of research in nanoelectronic communities. In this emerging field, incorporating 2D materials into three-terminal synaptic transistors has brought various advantages. However, achieving a stable and long-term weight-modulation in these synaptic transistors, which are typically based on interface charge storage, is still a challenge due to the nature of their spontaneous relaxation. The application of an atomically thin fluorographene layer into the synaptic junction region suppresses this issue and improves the efficiency, tunability, and symmetry of the synaptic plasticity as well as establishing a stable weight-regulation paradigm. These unique properties can be attributed to the dipolar rotation of C-F in fluorographene. To obtain a better physical understanding, a vacancy-dependent C-F dipolar rotation model is proposed and supported by hysteresis analysis and density functional theory calculations. As proposed and demonstrated, the unique fluorographene-based synaptic transistor may be a promising building block for constructing efficient neuromorphic computing hardware.

Keyword:

synaptic transistors long-term potentiation fluorographene spike timing dependent plasticity low-damage fluorination

Author Community:

  • [ 1 ] [Liu, Bo]Beijing Univ Technol, Coll Microelect, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Hong, Ming-Chun]Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan
  • [ 3 ] [Hou, Tuo-Hung]Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan
  • [ 4 ] [Hong, Ming-Chun]Natl Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan
  • [ 5 ] [Hou, Tuo-Hung]Natl Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan
  • [ 6 ] [Sahoo, Mamina]Chang Gung Univ, Dept Elect Engn, Taoyuan 33302, Taiwan
  • [ 7 ] [Ho, Yu-Ping]Chang Gung Univ, Dept Elect Engn, Taoyuan 33302, Taiwan
  • [ 8 ] [Liang, Hanyuan]Chang Gung Univ, Dept Elect Engn, Taoyuan 33302, Taiwan
  • [ 9 ] [Wang, Jer-Chyi]Chang Gung Univ, Dept Elect Engn, Taoyuan 33302, Taiwan
  • [ 10 ] [Lai, Chao-Sung]Chang Gung Univ, Dept Elect Engn, Taoyuan 33302, Taiwan
  • [ 11 ] [Ong, Bin Leong]Natl Univ Singapore, Dept Phys, Elect Mat Growth & Interface Characterizat Lab, 2 Sci Dr 3, Singapore 117551, Singapore
  • [ 12 ] [Tok, Eng Soon]Natl Univ Singapore, Dept Phys, Elect Mat Growth & Interface Characterizat Lab, 2 Sci Dr 3, Singapore 117551, Singapore
  • [ 13 ] [Di, MengFu]Univ Calif Riverside, Dept Elect & Comp Engn, Riverside, CA 92521 USA
  • [ 14 ] [Bow, Jong-Shing]Integrated Serv Technol, 10-1,Lixing 1st Rd, Hsinchu 30078, Taiwan
  • [ 15 ] [Liu, Zhiwei]Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrate Device, Chengdu 610054, Sichuan, Peoples R China
  • [ 16 ] [Lai, Chao-Sung]Chang Gung Univ, Biomed Engn Res Ctr, Biosensor Grp, Taoyuan 33302, Taiwan
  • [ 17 ] [Lai, Chao-Sung]Chang Gung Mem Hosp, Dept Nephrol, Linkou 33305, Taiwan
  • [ 18 ] [Lai, Chao-Sung]Ming Chi Univ Technol, Dept Mat Engn, New Taipei 24301, Taiwan

Reprint Author's Address:

  • [Hou, Tuo-Hung]Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan;;[Hou, Tuo-Hung]Natl Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan;;[Lai, Chao-Sung]Chang Gung Univ, Dept Elect Engn, Taoyuan 33302, Taiwan;;[Lai, Chao-Sung]Chang Gung Univ, Biomed Engn Res Ctr, Biosensor Grp, Taoyuan 33302, Taiwan;;[Lai, Chao-Sung]Chang Gung Mem Hosp, Dept Nephrol, Linkou 33305, Taiwan;;[Lai, Chao-Sung]Ming Chi Univ Technol, Dept Mat Engn, New Taipei 24301, Taiwan

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Source :

ADVANCED MATERIALS TECHNOLOGIES

ISSN: 2365-709X

Year: 2019

Issue: 10

Volume: 4

6 . 8 0 0

JCR@2022

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 33

SCOPUS Cited Count: 33

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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