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Author:

Ma, Pei (Ma, Pei.) | Xie, Hong-Yun (Xie, Hong-Yun.) | Chen, Quan-Xiu (Chen, Quan-Xiu.) | Liu, Rui (Liu, Rui.) | Chen, Liang (Chen, Liang.) | Wu, Jia-Hui (Wu, Jia-Hui.) | Zhang, Wan-Rong (Zhang, Wan-Rong.)

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EI Scopus

Abstract:

The effect of different base structural parameters on SiGe Heterojunction Phototransistor (HPT) performance is analyzed in this paper. It proposes a reference for designing SiGe HPT with both high responsivity and high characteristic frequency. Responsivity of 5.58 A/W and characteristic frequency of 21.29 GHz for 850 nm light are achieved when the thickness of base layer is 70nm with the doping concentration of 1.0×1019 cm-3. © 2018 IEEE.

Keyword:

Si-Ge alloys Silicon Phototransistors Integrated circuits Heterojunctions

Author Community:

  • [ 1 ] [Ma, Pei]Faculty of Information Technology, Beijing University of Technology, Beijing; 100124, China
  • [ 2 ] [Xie, Hong-Yun]Faculty of Information Technology, Beijing University of Technology, Beijing; 100124, China
  • [ 3 ] [Chen, Quan-Xiu]Faculty of Information Technology, Beijing University of Technology, Beijing; 100124, China
  • [ 4 ] [Liu, Rui]Faculty of Information Technology, Beijing University of Technology, Beijing; 100124, China
  • [ 5 ] [Chen, Liang]College of Physics and Electronic Engineering, Taishan University, Shandong; 271000, China
  • [ 6 ] [Wu, Jia-Hui]Faculty of Information Technology, Beijing University of Technology, Beijing; 100124, China
  • [ 7 ] [Zhang, Wan-Rong]Faculty of Information Technology, Beijing University of Technology, Beijing; 100124, China

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Year: 2018

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 13

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