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Author:

Wang Pengfei (Wang Pengfei.) | Zhu Hui (Zhu Hui.) | Zhang Yingqiao (Zhang Yingqiao.) | Feng Shiwei (Feng Shiwei.) (Scholars:冯士维) | Guo Chunsheng (Guo Chunsheng.) | Zhang Yamin (Zhang Yamin.) | Meng Xiao (Meng Xiao.) | Qi Qiong (Qi Qiong.)

Indexed by:

EI Scopus SCIE

Abstract:

The (001) oriented BiFeO3 thin film was deposited on the Nb:SrTiO3 substrate by radio frequency magnetron sputtering technology, and the bipolar resistive switching effect was observed in the BiFeO3/Nb: SrTiO3 heterostructure. The results showed that the ratio between the high resistance and low resistance was more than two orders at a reading pulse of -0.5 V and it exhibited excellent retention over 3600 s. The current density-voltage characteristic was dominated by the space-charge-limited conduction. The resistive switching effect of the structure was attributed to the trapping/detrapping of the charge carriers.

Keyword:

space-charge-limited conduction BiFeO3 films bipolar resistive switching sputter

Author Community:

  • [ 1 ] [Wang Pengfei]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Zhu Hui]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang Yingqiao]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Feng Shiwei]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Guo Chunsheng]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang Yamin]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 7 ] [Meng Xiao]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Qi Qiong]Chinese Acad Sci, Inst Semicond, Natl Engn Res Ctr Optoelect Devices, Beijing 100083, Peoples R China

Reprint Author's Address:

  • [Zhu Hui]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China

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Source :

JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION

ISSN: 1000-2413

Year: 2018

Issue: 6

Volume: 33

Page: 1360-1364

1 . 6 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:260

JCR Journal Grade:4

Cited Count:

WoS CC Cited Count: 1

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

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