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Author:

Wang, Denggui (Wang, Denggui.) | Zhang, Xingwang (Zhang, Xingwang.) | Guo, Gencai (Guo, Gencai.) | Gao, Shihan (Gao, Shihan.) | Li, Xingxing (Li, Xingxing.) | Meng, Junhua (Meng, Junhua.) (Scholars:孟军华) | Yin, Zhigang (Yin, Zhigang.) | Liu, Heng (Liu, Heng.) | Gao, Menglei (Gao, Menglei.) | Cheng, Likun (Cheng, Likun.) | You, Jingbi (You, Jingbi.) | Wang, Ruzhi (Wang, Ruzhi.) (Scholars:王如志)

Indexed by:

EI Scopus SCIE PubMed

Abstract:

Alloying transition metal dichalcogenides (TMDs) with different compositions is demonstrated as an effective way to acquire 2D semiconductors with widely tunable bandgaps. Herein, for the first time, the large-area synthesis of layered HfS2(1-x)Se2x alloys with fully tunable chemical compositions on sapphire by chemical vapor deposition is reported, greatly expanding and enriching the family of 2D TMDs semiconductors. The configuration and high quality of their crystal structure are confirmed by various characterization techniques, and the bandgap of these alloys can be continually modulated from 2.64 to 1.94 eV with composition variations. Furthermore, prototype HfS2(1-x)Se2x photodetectors with different Se compositions are fabricated, and the HfSe2 photodetector manifests the best performance among all the tested HfS2(1-x)Se2x devices. Remarkably, by introducing a hexagonal boron nitride layer, the performance of the HfSe2 photodetector is greatly improved, exhibiting a high on/off ratio exceeding 10(5), an ultrafast response time of about 190 mu s, and a high detectivity of 10(12) Jones. This simple and controllable approach opens up a new way to produce high-quality 2D HfS2(1-x)Se2x layers, which are highly qualified candidates for the next-generation application in high-performance optoelectronics.

Keyword:

chemical vapor deposition transition metal dichalcogenides alloying photodetectors HfSe2

Author Community:

  • [ 1 ] [Wang, Denggui]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 2 ] [Zhang, Xingwang]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 3 ] [Gao, Shihan]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 4 ] [Li, Xingxing]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 5 ] [Meng, Junhua]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 6 ] [Yin, Zhigang]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 7 ] [Liu, Heng]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 8 ] [Gao, Menglei]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 9 ] [Cheng, Likun]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 10 ] [You, Jingbi]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 11 ] [Wang, Denggui]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China
  • [ 12 ] [Zhang, Xingwang]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China
  • [ 13 ] [Gao, Shihan]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China
  • [ 14 ] [Li, Xingxing]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China
  • [ 15 ] [Meng, Junhua]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China
  • [ 16 ] [Yin, Zhigang]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China
  • [ 17 ] [Liu, Heng]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China
  • [ 18 ] [Gao, Menglei]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China
  • [ 19 ] [Cheng, Likun]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China
  • [ 20 ] [You, Jingbi]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China
  • [ 21 ] [Guo, Gencai]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 22 ] [Wang, Ruzhi]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

Reprint Author's Address:

  • [Zhang, Xingwang]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China;;[Zhang, Xingwang]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100083, Peoples R China

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Source :

ADVANCED MATERIALS

ISSN: 0935-9648

Year: 2018

Issue: 44

Volume: 30

2 9 . 4 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:260

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 54

SCOPUS Cited Count: 54

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 11

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