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Author:

Fan, T. (Fan, T..) | Liu, F. R. (Liu, F. R..) (Scholars:刘富荣) | Li, W. Q. (Li, W. Q..) | Guo, J. C. (Guo, J. C..) | Wang, Y. H. (Wang, Y. H..) | Sun, N. X. (Sun, N. X..) | Liu, F. (Liu, F..)

Indexed by:

EI Scopus SCIE

Abstract:

In this paper, accumulated crystallization of amorphous Ge2Sb2Te5 (a-GST) films induced by a multi-pulsed nanosecond (ns) excimer laser was investigated by x-ray diffraction (XRD), atomic force microscopy, field-emission scanning electron microscopy, x-ray photoelectron spectroscopy (XPS) and a spectrophotometer. XRD analyses revealed that detectable crystallization was firstly observed in the preferred orientation (200), followed by the orientations (220) and (111) after two pulses. Optical contrast, determined by crystallinity as well as surface roughness, was found to retain a linear relation within the first three pulses. A layered growth mechanism from the top surface to the interior of a-GST films was used to explain the crystallization behavior induced by the multi-pulse ns laser. XPS analyses for bond rearrangement and electronic structure further suggested that the crystallization process was performed by generating new bonds of Ge-Te and Sb-Te after laser irradiations. This paper presents the potential of multi-level devices and tunable thermal emitters based on controllable crystallization of phase-change materials.

Keyword:

optical contrast Ge2Sb2Te5 multi-pulse laser crystallization mechanism

Author Community:

  • [ 1 ] [Fan, T.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Liu, F. R.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Li, W. Q.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Guo, J. C.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Wang, Y. H.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Fan, T.]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China
  • [ 7 ] [Liu, F. R.]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Li, W. Q.]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China
  • [ 9 ] [Guo, J. C.]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China
  • [ 10 ] [Wang, Y. H.]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China
  • [ 11 ] [Sun, N. X.]Northeastern Univ, Elect & Comp Engn Dept, Boston, MA 02115 USA
  • [ 12 ] [Liu, F.]Northwestern Polytech Univ, State Key Lab Solidificat Proc, Xian, Shaanxi, Peoples R China

Reprint Author's Address:

  • 刘富荣

    [Liu, F. R.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China;;[Liu, F. R.]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China

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Source :

SEMICONDUCTOR SCIENCE AND TECHNOLOGY

ISSN: 0268-1242

Year: 2017

Issue: 9

Volume: 32

1 . 9 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:158

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 14

SCOPUS Cited Count: 15

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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