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Author:

Li, W. Q. (Li, W. Q..) | Liu, F. R. (Liu, F. R..) (Scholars:刘富荣)

Indexed by:

CPCI-S EI Scopus SCIE

Abstract:

The crystallization mechanism in an amorphous Ge2Sb2Te5 (a-GST) thin film induced by a single pulsed laser was investigated in this paper. The finite element simulation and x-ray diffraction analysis showed that two kinds of crystallization mechanisms performed for the laser-induced phase transition of a-GST, that is, the solid-state phase transition took place at a lower laser fluence while the liquid-solid phase transition occurred at a relatively high laser fluence. Transmission electron microscopy observations showed that the microstructure in the liquid-solid phase transition was more uniform as compared to that in the solid-state phase transition because of poor atom diffusion. Crystallization characteristics at different laser fluences and film thickness were elucidated. It was found that at a lower laser fluence a thinner film had the better crystallinity owing to thermal convection, while at a higher laser fluence a thicker film showed the better crystallinity due to the release of latent heat in the liquid-solid phase transition. These findings enable a deep understanding of ultra-fast phase transition induced by laser irradiation. (C) 2018 Laser Institute of America.

Keyword:

laser fluence crystallization mechanism GST crystallinity

Author Community:

  • [ 1 ] [Li, W. Q.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Liu, F. R.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Li, W. Q.]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Liu, F. R.]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China

Reprint Author's Address:

  • 刘富荣

    [Liu, F. R.]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China;;[Liu, F. R.]Beijing Univ Technol, Beijing Engn Res Ctr Appl Laser Technol, Beijing 100124, Peoples R China

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Source :

JOURNAL OF LASER APPLICATIONS

ISSN: 1042-346X

Year: 2018

Issue: 3

Volume: 30

2 . 1 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:156

JCR Journal Grade:3

Cited Count:

WoS CC Cited Count: 1

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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