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Author:

Li, Ruoyuan (Li, Ruoyuan.) | Wang, Zhanguo (Wang, Zhanguo.) | Xu, Bo (Xu, Bo.) | Jin, Peng (Jin, Peng.) | Zhang, Chunling (Zhang, Chunling.) | Guo, Xia (Guo, Xia.) | Chen, Min (Chen, Min.)

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EI Scopus PKU CSCD

Abstract:

The wet oxidation of AlGaAs with high Al content in a distributed Bragg reflectors (DBR) is studied by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Some voids distribute along the oxide/GaAs interfaces due to the stress induced by the wet oxidation of the AlGaAs layers. These voids decrease the shrinkage of the Al2O3 layers to 8% instead of the theoretical 20% when compared to the unoxidized AlGaAs layers. With the extension of oxidation time, the reactants are more completely transported to the front interface and the products are more completely transported out along the porous interfaces. As a result, the oxide quality is better.

Keyword:

Interfaces (materials) Semiconducting gallium arsenide Transmission electron microscopy Oxidation Scanning electron microscopy Alumina Refractive index Stress analysis X ray diffraction Semiconducting aluminum compounds Lasers

Author Community:

  • [ 1 ] [Li, Ruoyuan]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • [ 2 ] [Wang, Zhanguo]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • [ 3 ] [Xu, Bo]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • [ 4 ] [Jin, Peng]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • [ 5 ] [Zhang, Chunling]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • [ 6 ] [Guo, Xia]Laboratory of Photoelectronics Technology, Beijing University of Technology, Beijing 100022, China
  • [ 7 ] [Chen, Min]Laboratory of Photoelectronics Technology, Beijing University of Technology, Beijing 100022, China

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Source :

Chinese Journal of Semiconductors

ISSN: 0253-4177

Year: 2005

Issue: 8

Volume: 26

Page: 1519-1523

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

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