Carbon　nanofilms　are　directly　grown　on　silicon　substrates　by　plasma-enhanced　hot　filament　chemical　vapor　deposition　in　methane　environment.　It　is　shown　that　the　nanofilms　are　composed　of　aligned　carbon　nanoflakes　by　extensive　investigation　of　experimental　results　of　field　emission　scanning　electron　microscopy,　micro-Raman　spectroscopy　and　transmission　electron　microscopy.　In　comparison　with　the　graphene-like　films　grown　without　plasmas,　the　carbon　nanoflakes　grow　in　an　alignment　mode　and　the　growth　rate　of　the　films　is　increased.　The　effects　of　the　plasma　on　the　growth　of　the　carbon　nanofilms　are　studied.　The　plasma　plays　three　main　effects　of　(1)　promoting　the　separation　of　the　carbon　nanoflakes　from　the　silicon　substrate,　(2)　accelerating　the　motion　of　hydrocarbon　radicals,　and　(3)　enhancing　the　deposition　of　hydrocarbon　ions　onto　the　substrate　surface.　Due　to　these　plasma-specific　effects,　the　carbon　nanofilms　can　be　formed　from　the　aligned　carbon　nanoflakes　with　a　high　rate.　These　results　advance　our　knowledge　on　the　synthesis,　properties　and　applications　of　graphene-based　materials.　(C)　2014　Elsevier　B.V.　All　rights　reserved.