Highly　ordered　TiO2　nanotube　array　films　were　fabricated　on　conducting　fluorine-doped　tin　oxide　(FTO)　glass　substrate　in　NH4HF2/glycol　electrolyte　via　anodization　of　Ti　film,　which　was　deposited　by　direct　current　magnetron　sputtering.　Ti　films　obtained　by　direct　current　magnetron　sputtering　method　have　three　growth　regions　and　that　deposited　at　410　degrees　C　has　smooth　surface　which　is　favorable　for　the　anodization.　The　anodization　voltage　affects　the　diameter　of　TiO2　nanotube　and　the　reason　has　been　discussed.　A　12.5　mu　m-thick　TiO2　nanotube　array　film　has　been　obtained　and　exhibits　a　high　transmittance　of　32%　in　the　visible　light　range.　The　bandgap　of　the　thin　film　is　calculated　to　be　3.08　eV　based　on　the　UV-vis　transmission　spectra,　and　its　tail　extends　to　2.94　eV.　The　electrochemical　impedance　spectroscopy　indicates　that　the　impedance　TiO2　nanotube　film　decreases　after　light　illumination.　(C)　2013　Elsevier　B.　V.　All　rights　reserved.