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Author:

Xu, Longxiang (Xu, Longxiang.) | Lu, Wengang (Lu, Wengang.) | Hu, Chen (Hu, Chen.) | Guo, Qixun (Guo, Qixun.) | Shang, Shuai (Shang, Shuai.) | Xu, Xiulan (Xu, Xiulan.) | Yu, Guanghua (Yu, Guanghua.) | Yan, Yu (Yan, Yu.) | Wang, Lihua (Wang, Lihua.) (Scholars:王立华) | Teng, Jiao (Teng, Jiao.)

Indexed by:

EI Scopus SCIE CSCD

Abstract:

The valley splitting has been realized in the graphene/Ni heterostructure with the splitting value of 14 meV, and the obtained valley injecting efficiency from the heterostructure into graphene was 6.18% [Phys. Rev. B 92 115404 (2015)]. In this paper, we report a way to improve the valley splitting and the valley injecting efficiency of the graphene/Ni heterostructure. By intercalating an Au monolayer between the graphene and the Ni, the split can be increased up to 50 meV. However, the valley injecting efficiency is not improved because the splitted valley area of graphene moves away from the Fermi level. Then, we mend the deviation by covering a monolayer of Cu on the graphene. As a result, the valley injecting efficiency of the Cu/graphene/Au/Ni heterostructure reaches 10%, which is more than 60% improvement compared to the simple graphene/Ni heterostructure. Then we theoretically design a valley-injection device based on the Cu/graphene/Au/Ni heterostructure and demonstrate that the valley injection can be easily switched solely by changing the magnetization direction of Ni, which can be used to generate and control the valley-polarized current.

Keyword:

valleytronics valley-polarized transport two-dimensional materials

Author Community:

  • [ 1 ] [Xu, Longxiang]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 2 ] [Guo, Qixun]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 3 ] [Shang, Shuai]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 4 ] [Xu, Xiulan]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 5 ] [Yu, Guanghua]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 6 ] [Teng, Jiao]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 7 ] [Lu, Wengang]Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
  • [ 8 ] [Lu, Wengang]Beijing Key Lab Nanomat & Nanodevices, Beijing 100190, Peoples R China
  • [ 9 ] [Hu, Chen]McGill Univ, Ctr Phys Mat, Montreal, PQ H3A 2T8, Canada
  • [ 10 ] [Hu, Chen]McGill Univ, Dept Phys, Montreal, PQ H3A 2T8, Canada
  • [ 11 ] [Yan, Yu]Univ Sci & Technol Beijing, Corros & Protect Ctr, Key Lab Environm Fracture MOE, Beijing 100083, Peoples R China
  • [ 12 ] [Wang, Lihua]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing Key Lab Microstruct & Property Adv Mat, Beijing 100124, Peoples R China

Reprint Author's Address:

  • [Teng, Jiao]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China;;[Lu, Wengang]Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China;;[Lu, Wengang]Beijing Key Lab Nanomat & Nanodevices, Beijing 100190, Peoples R China

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Source :

CHINESE PHYSICS B

ISSN: 1674-1056

Year: 2020

Issue: 7

Volume: 29

1 . 7 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:100

Cited Count:

WoS CC Cited Count: 5

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

Online/Total:771/10839009
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