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Author:

Pan, Guanzhong (Pan, Guanzhong.) | Xun, Meng (Xun, Meng.) | Sun, Yun (Sun, Yun.) | Zhao, Zhuangzhuang (Zhao, Zhuangzhuang.) | Xu, Chen (Xu, Chen.) | Xie, Yiyang (Xie, Yiyang.) | Wu, Dexin (Wu, Dexin.) | Zhou, Jingtao (Zhou, Jingtao.)

Indexed by:

EI Scopus SCIE

Abstract:

An accurate far-field intensity distribution model of coherent VCSEL array is established based on Fraunhofer diffraction theory, of which the calculated far-field pattern can be configured by tuning the phase distribution of the array. In experiment, configurable beam emissions are achieved in two-dimensional coherent square 2 x 2 VCSEL arrays and triangular 3-element VCSEL arrays by engineering the phase distribution of the array through simply constructing the array structure. Single-lobe beam, double-lobe beam, and four-lobe beam are obtained in these arrays. Besides, beam shape manipulation is also realized by adjusting the ratio of horizontal dimension to vertical dimension of the array. The experimental results are in good agreement with the calculated results from the established theoretical model.

Keyword:

Beam manipulation Coherently coupled Fraunhofer diffraction theory VCSEL array

Author Community:

  • [ 1 ] [Pan, Guanzhong]Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
  • [ 2 ] [Xun, Meng]Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
  • [ 3 ] [Sun, Yun]Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
  • [ 4 ] [Zhao, Zhuangzhuang]Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
  • [ 5 ] [Wu, Dexin]Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
  • [ 6 ] [Zhou, Jingtao]Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
  • [ 7 ] [Xu, Chen]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Xie, Yiyang]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China

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Source :

OPTICS AND LASER TECHNOLOGY

ISSN: 0030-3992

Year: 2022

Volume: 149

5 . 0

JCR@2022

5 . 0 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:49

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 4

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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