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Author:

Pan, Shijie (Pan, Shijie.) | Feng, Shiwei (Feng, Shiwei.) (Scholars:冯士维) | Li, Xuan (Li, Xuan.) | Bai, Kun (Bai, Kun.) | Lu, Xiaozhuang (Lu, Xiaozhuang.) | Zhang, Yamin (Zhang, Yamin.) | Zhou, Lixing (Zhou, Lixing.) | Rui, Erming (Rui, Erming.) | Jiao, Qiang (Jiao, Qiang.) | Tian, Yu (Tian, Yu.)

Indexed by:

EI Scopus SCIE

Abstract:

This paper presents a detailed investigation of trapping effect in AlGaN/GaN high-electron-mobility transistors based on the pulsed current-voltage characterization, drain voltage transient (DVT) measurement, and capacitance deep-level transient spectroscopy (C-DLTS). By monitoring the DVTs at various filling voltages and temperatures, the properties of three electron traps were obtained with the DVT measurements. Specifically, the energy levels of the former two traps were determined to be 0.28 and 0.48 eV, which was confirmed by the C-DLTS measurement performed on the same device. In addition, a third temperature-independent trap located in the GaN buffer was observed only with the DVT measurement, indicating the advantage of transient curves measurement in characterizing the traps insensitive to temperature. The combined measurements demonstrate the correlation of different techniques, which allows identifying the same trap levels to investigate the physical origin of traps.

Keyword:

gallium nitride (GaN) drain voltage transients (DVTs) high-electron-mobility transistors (HEMTs) trap capacitance deep-level transient spectroscopy (C-DLTS)

Author Community:

  • [ 1 ] [Pan, Shijie]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 3 ] [Li, Xuan]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 4 ] [Bai, Kun]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 5 ] [Lu, Xiaozhuang]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang, Yamin]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 7 ] [Zhou, Lixing]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 8 ] [Rui, Erming]China Astronaut Stand Inst, Beijing 100071, Peoples R China
  • [ 9 ] [Jiao, Qiang]China Astronaut Stand Inst, Beijing 100071, Peoples R China
  • [ 10 ] [Tian, Yu]China Astronaut Stand Inst, Beijing 100071, Peoples R China

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Source :

SEMICONDUCTOR SCIENCE AND TECHNOLOGY

ISSN: 0268-1242

Year: 2022

Issue: 9

Volume: 37

1 . 9

JCR@2022

1 . 9 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:41

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 3

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

Affiliated Colleges:

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