In　this　work,　we　represent　an　elegant　way　for　the　fabrication　of　hybrid　Si　nanowires　and　nanoholes　(NWs-NHS)　arrays.　In　this　article,　we　characterized　the　array　structures　and　obtained　their　periods,　diameters　and　etching　depths　by　collaborating　the　laser　interference　lithography　(LIL)　and　metal-assisted　chemical　etching　(MACE).　First　of　all,　silver　(Ag)　films　were　placed　on　Silicon　(Si)　substrates,　and　a　1064　nm　high　power　laser　source　was　used.　Afterward,　MACE　was　done　for　the　fabrication　of　hybrid　Si　(NWs-Hs)　arrays.　The　images　with　the　surface　characteristics　were　obtained　by　scanning　electron　microscope　(SEM).　This　work　offers　a　simple,　less　time-consuming,　and　cost-effective　process　of　micro-nano　pattern　fabrication.　　©　2022　IEEE.