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Author:

Hu, Liangchen (Hu, Liangchen.) | Deng, Jun (Deng, Jun.) | Xie, Yiyang (Xie, Yiyang.) | Qian, Fengsong (Qian, Fengsong.) | Dong, Yibo (Dong, Yibo.) | Xu, Chen (Xu, Chen.)

Indexed by:

Scopus SCIE

Abstract:

Graphene is an ideal material for flexible optoelectronic devices due to its excellent electrical and optical properties. However, the extremely high growth temperature of graphene has greatly limited the direct fabrication of graphene-based devices on flexible substrates. Here, we have realized in situ growth of graphene on a flexible polyimide substrate. Based on the multi-temperature-zone chemical vapor deposition cooperated with bonding a Cu-foil catalyst onto the substrate, the growth temperature of graphene was controlled at only 300 degrees C, enabling the structural stability of polyimide during growth. Thus, large-area high-quality monolayer graphene film was successfully in situ grown on polyimide. Furthermore, a PbS-graphene flexible photodetector was fabricated using the graphene. The responsivity of the device reached 10(5) A/W with 792 nm laser illumination. The in-situ growth ensures good contact between graphene and substrate; therefore, the device performance can remain stable after multiple bending. Our results provide a highly reliable and mass-producible path for graphene-based flexible devices.

Keyword:

low temperature growth transfer-free graphene flexible substrate

Author Community:

  • [ 1 ] [Hu, Liangchen]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 2 ] [Deng, Jun]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 3 ] [Xie, Yiyang]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 4 ] [Qian, Fengsong]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 5 ] [Xu, Chen]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 6 ] [Dong, Yibo]Univ Shanghai Sci & Technol, Inst Photon Chips, Shanghai 200093, Peoples R China

Reprint Author's Address:

  • [Xie, Yiyang]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China;;[Xu, Chen]Beijing Univ Technol, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China;;[Dong, Yibo]Univ Shanghai Sci & Technol, Inst Photon Chips, Shanghai 200093, Peoples R China;;

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Source :

NANOMATERIALS

Year: 2023

Issue: 8

Volume: 13

5 . 3 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:26

Cited Count:

WoS CC Cited Count: 4

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 10

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