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Author:

Wang, Chen (Wang, Chen.) | Zhu, Hui (Zhu, Hui.) | Wang, Si (Wang, Si.) | Chu, Daping (Chu, Daping.) | Liu, Kai (Liu, Kai.) | Jin, Lei (Jin, Lei.) | Li, Rui (Li, Rui.) | Liu, Jie (Liu, Jie.) | Feng, Shiwei (Feng, Shiwei.) (Scholars:冯士维) | Guo, Chunsheng (Guo, Chunsheng.) | Zhang, Yamin (Zhang, Yamin.)

Indexed by:

EI Scopus SCIE

Abstract:

The influence of uniaxial tensile strains with different orientations to the conduction channel on the electrical and physical properties of AlGaN/GaN high-electron-mobility transistors (HEMTs) was investigated. The output current decreases with the increase of the tensile strain as the orientation of strain changes from 0&#with respect to the conduction channel. The results of the measured curves show that for the same strain level the two-dimensional electron gas (2DEG) density decreases monotonically to different extents depending on the strain orientation. A conversion of the strain at different orientations to an equivalent strain parallel to the conduction channel shows that the theoretical resultant changes of the 2DEG density are consistent with the experimental results. The corresponding electron mobility is also calculated, which shows a decreasing trend under the tensile strain. Furthermore, using the transient current method, it is established that the detrapping time constant increases as a result of the tensile strain, which is ascribed to the movement of the trap level away from the conduction band.

Keyword:

two-dimensional electron gas (2DEG) high-electron mobility transistor trap GaN strain orientation

Author Community:

  • [ 1 ] [Wang, Chen]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China
  • [ 2 ] [Zhu, Hui]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China
  • [ 3 ] [Wang, Si]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China
  • [ 4 ] [Jin, Lei]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China
  • [ 5 ] [Li, Rui]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China
  • [ 6 ] [Liu, Jie]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China
  • [ 7 ] [Feng, Shiwei]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China
  • [ 8 ] [Guo, Chunsheng]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China
  • [ 9 ] [Zhang, Yamin]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China
  • [ 10 ] [Chu, Daping]Univ Cambridge, Elect Engn Div, Cambridge CB3 0FA, England
  • [ 11 ] [Liu, Kai]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China

Reprint Author's Address:

  • [Zhu, Hui]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China

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Source :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

Year: 2020

Issue: 2

Volume: 67

Page: 449-454

3 . 1 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:115

Cited Count:

WoS CC Cited Count: 17

SCOPUS Cited Count: 19

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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