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Author:

Tan, Haoqi (Tan, Haoqi.) | Zhao, Yan (Zhao, Yan.) (Scholars:赵艳) | Xu, Chen (Xu, Chen.) (Scholars:徐晨) | Jiang, Yijian (Jiang, Yijian.) (Scholars:蒋毅坚)

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EI Scopus PKU CSCD

Abstract:

The GaN epitaxial wafers with a p-GaN surface are irradiated with an excimer laser at different energy densities and pulse numbers. The laser irradiation induced changes in optical and electrical properties of GaN epitaxial wafers are examined using photoluminescence, cathode luminescence, X-ray photoelectron spectroscopy, Hall, I-Vcharacterization. Experimental results show that under an appropriate laser irradiating condition and annealing treatment in N2, the luminescent and electrical properties of the samples are improved to different degrees. The irradiated and annealed samples are transformed into light emitting diode (LED) device with semiconductor packing process, and the relationship between the luminescent properties of LED and the laser energy density or annealing atmosphere are investigated. After laser irradiaiton and annealing treatment, the light output power of GaN-based LED increases at least about 37% compared with non-irradiated samples, which shows that the improvement of the electrical properties of GaN epitaxial materials plays important role in enhancing the luminescent properties of the LED device. © 2015, Science Press. All right reserved.

Keyword:

Electric properties Excimer lasers Light X ray photoelectron spectroscopy Annealing Wide band gap semiconductors Gallium nitride Irradiation Luminescence Silicon wafers Materials Semiconductor lasers Laser beam effects III-V semiconductors Light emitting diodes

Author Community:

  • [ 1 ] [Tan, Haoqi]Institute of Laser Engineering, Beijing University of Technology, Beijing; 100124, China
  • [ 2 ] [Zhao, Yan]Institute of Laser Engineering, Beijing University of Technology, Beijing; 100124, China
  • [ 3 ] [Xu, Chen]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing; 100124, China
  • [ 4 ] [Jiang, Yijian]Institute of Laser Engineering, Beijing University of Technology, Beijing; 100124, China

Reprint Author's Address:

  • 蒋毅坚

    [jiang, yijian]institute of laser engineering, beijing university of technology, beijing; 100124, china

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Source :

Chinese Journal of Lasers

ISSN: 0258-7025

Year: 2015

Issue: 10

Volume: 42

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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