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Author:

Fu, Qiang (Fu, Qiang.) | Zhang, Wanrong (Zhang, Wanrong.) | Jin, Dongyue (Jin, Dongyue.) | Zhao, Yanxiao (Zhao, Yanxiao.) | Zhang, Lianghao (Zhang, Lianghao.)

Indexed by:

EI Scopus CSCD

Abstract:

Compared with BVCEO, BVCES is more related to collector optimization and more practical significance, so that BVCES × fT rather than BVCEO × fT is employed in representing the limit of the product of the breakdown voltage-cutoff frequency in SiGe HBT for collector engineering design. Instead of a single decrease in collector doping to improve BVCES × fT and BVCEO × fT, a novel thin composite of N- and P+ doping layers inside the CB SCR is presented to improve the well-known tradeoff between the breakdown voltage and cut-off frequency in SiGe HBT, and BVCES and BVCEO are improved respectively with slight degradation in fT. As a result, the BVCES × fT product is improved from 537.57 to 556.4 GHz•V, and the BVCEO × fT product is improved from 309.51 to 326.35 GHz•V. © 2015 Chinese Institute of Electronics.

Keyword:

Silicon alloys Heterojunction bipolar transistors Electric breakdown Cutoff frequency Product design

Author Community:

  • [ 1 ] [Fu, Qiang]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 2 ] [Fu, Qiang]College of Physics, Liaoning University, Shenyang, China
  • [ 3 ] [Zhang, Wanrong]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 4 ] [Jin, Dongyue]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 5 ] [Zhao, Yanxiao]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 6 ] [Zhang, Lianghao]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China

Reprint Author's Address:

  • [fu, qiang]college of physics, liaoning university, shenyang, china;;[fu, qiang]college of electronic information and control engineering, beijing university of technology, beijing, china

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Source :

Journal of Semiconductors

ISSN: 1674-4926

Year: 2015

Issue: 4

Volume: 36

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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