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Author:

Wang, Xiaohua (Wang, Xiaohua.) | Li, Jingzhen (Li, Jingzhen.) | Yan, Yong (Yan, Yong.) | Wen, Tao (Wen, Tao.) | Liu, Ming (Liu, Ming.) | You, Congya (You, Congya.) | Li, Jingfeng (Li, Jingfeng.) | Yu, Songlin (Yu, Songlin.) | Zhang, Yongzhe (Zhang, Yongzhe.)

Indexed by:

EI Scopus SCIE

Abstract:

This paper studies superlattice materials with M barrier (InAs/GaSb/AlSb/GaSb superlattice) and B barrier (InAs/AlSb superlattice) structures. Firstly, it introduces the diffusion current, generation-recombination current, tunneling current and surface leakage current in devices, and analyzes the factors affecting different dark current mechanisms. Secondly, it theoretically analyzes the influence of the two barrier structures on device performance. Finally, devices were fabricated using these two structures, and the device performance was characterized. At a bias voltage of -50 mV and operating temperature of 77K. The PIMN type long-wave infrared (LWIR) detector has an RA of 91.4 omega cm2 and a LW dark current density of 3.51 x 10-4 A cm-2. The PIBN type LWIR detector has an RA of 439 omega cm2 and a LW dark current density of 2.81 x 10-4 A cm-2. Meanwhile, by fitting the data at different temperatures, the activation energy Ea of the PIMN type LWIR detector is 119.8 meV, with dark current mainly determined by diffusion current and generation-recombination current. The activation energy Ea of the PIBN type LWIR detector is 126.2 meV, with dark current mainly determined by diffusion current. This experimentally verifies the dominant dark current mechanisms for the two barrier structures of LWIR detectors, providing strong support for the design of superlattice detector structures.

Keyword:

Dark current mechanisms Superlattice Detector Barrier

Author Community:

  • [ 1 ] [Wang, Xiaohua]Beijing Univ Technol, Coll Mat Sci & Engn, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China
  • [ 2 ] [Li, Jingzhen]Beijing Univ Technol, Coll Mat Sci & Engn, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang, Yongzhe]Beijing Univ Technol, Coll Mat Sci & Engn, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China
  • [ 4 ] [Li, Jingzhen]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China
  • [ 5 ] [Zhang, Yongzhe]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China
  • [ 6 ] [Yan, Yong]North China Res Inst Electroopt, Beijing 100015, Peoples R China
  • [ 7 ] [Wen, Tao]North China Res Inst Electroopt, Beijing 100015, Peoples R China
  • [ 8 ] [Liu, Ming]North China Res Inst Electroopt, Beijing 100015, Peoples R China
  • [ 9 ] [You, Congya]North China Res Inst Electroopt, Beijing 100015, Peoples R China
  • [ 10 ] [Li, Jingfeng]North China Res Inst Electroopt, Beijing 100015, Peoples R China
  • [ 11 ] [Yu, Songlin]North China Res Inst Electroopt, Beijing 100015, Peoples R China

Reprint Author's Address:

  • [Li, Jingzhen]Beijing Univ Technol, Coll Mat Sci & Engn, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China;;[Zhang, Yongzhe]Beijing Univ Technol, Coll Mat Sci & Engn, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China;;[Yu, Songlin]North China Res Inst Electroopt, Beijing 100015, Peoples R China

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Source :

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

ISSN: 1369-8001

Year: 2024

Volume: 173

4 . 1 0 0

JCR@2022

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

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Chinese Cited Count:

30 Days PV: 0

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