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Author:

He, Wenxin (He, Wenxin.) | Xing, Yanhui (Xing, Yanhui.) | Fang, Peijing (Fang, Peijing.) | Han, Zisuo (Han, Zisuo.) | Yu, Zhipeng (Yu, Zhipeng.) | Zhan, Rongbin (Zhan, Rongbin.) | Han, Jun (Han, Jun.) | Guan, Baolu (Guan, Baolu.) | Zhang, Baoshun (Zhang, Baoshun.) | Lv, Weiming (Lv, Weiming.) | Zeng, Zhongming (Zeng, Zhongming.)

Indexed by:

EI Scopus SCIE

Abstract:

The use of two-dimensional materials and van der Waals heterostructures holds great potential for improving the performance of memristors Here, we present SnS2/MoTe2 heterostructure synaptic transistors. Benefiting from the ultra-low dark current of the heterojunction, the power consumption of the synapse is only 19 pJ per switching under 0.1 V bias, comparable to that of biological synapses. The synaptic device based on the SnS2/MoTe2 demonstrates various synaptic functionalities, including short-term plasticity, long-term plasticity, and paired-pulse facilitation. In particular, the synaptic weight of the excitatory postsynaptic current can reach 109.8%. In addition, the controllability of the long-term potentiation and long-term depression are discussed. The dynamic range (G(max)/G(min)) and the symmetricity values of the synaptic devices are approximately 16.22 and 6.37, and the non-linearity is 1.79. Our study provides the possibility for the application of 2D material synaptic devices in the field of low-power information storage.

Keyword:

low power consumption artificial synapse heterostructure two-dimensional material

Author Community:

  • [ 1 ] [He, Wenxin]Beijing Univ Technol, Coll Microelect, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 2 ] [Xing, Yanhui]Beijing Univ Technol, Coll Microelect, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 3 ] [Han, Zisuo]Beijing Univ Technol, Coll Microelect, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 4 ] [Han, Jun]Beijing Univ Technol, Coll Microelect, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 5 ] [Guan, Baolu]Beijing Univ Technol, Coll Microelect, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China
  • [ 6 ] [He, Wenxin]Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Nanofabricat Facil, Suzhou 215123, Peoples R China
  • [ 7 ] [Fang, Peijing]Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Nanofabricat Facil, Suzhou 215123, Peoples R China
  • [ 8 ] [Han, Zisuo]Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Nanofabricat Facil, Suzhou 215123, Peoples R China
  • [ 9 ] [Yu, Zhipeng]Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Nanofabricat Facil, Suzhou 215123, Peoples R China
  • [ 10 ] [Zhan, Rongbin]Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Nanofabricat Facil, Suzhou 215123, Peoples R China
  • [ 11 ] [Zhang, Baoshun]Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Nanofabricat Facil, Suzhou 215123, Peoples R China
  • [ 12 ] [Lv, Weiming]Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Nanofabricat Facil, Suzhou 215123, Peoples R China
  • [ 13 ] [Zeng, Zhongming]Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Nanofabricat Facil, Suzhou 215123, Peoples R China

Reprint Author's Address:

  • [Xing, Yanhui]Beijing Univ Technol, Coll Microelect, Key Lab Optoelect Technol, Minist Educ, Beijing 100124, Peoples R China;;[Lv, Weiming]Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Nanofabricat Facil, Suzhou 215123, Peoples R China;;

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Source :

NANOTECHNOLOGY

ISSN: 0957-4484

Year: 2024

Issue: 33

Volume: 35

3 . 5 0 0

JCR@2022

Cited Count:

WoS CC Cited Count: 1

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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