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Author:

Zheng, Xiang (Zheng, Xiang.) | Feng, Shiwei (Feng, Shiwei.) (Scholars:冯士维) | Peng, Chao (Peng, Chao.) | Lin, Gang (Lin, Gang.) | Bai, Lin (Bai, Lin.) | Li, Xuan (Li, Xuan.) | Yang, Ying (Yang, Ying.) | Pan, Shijie (Pan, Shijie.) | Hu, Zhaoxu (Hu, Zhaoxu.) | Li, Xiaoyang (Li, Xiaoyang.) (Scholars:李晓阳) | Zhang, Yamin (Zhang, Yamin.)

Indexed by:

EI Scopus SCIE

Abstract:

Theeffects of gamma rays on two kinds of GaN high-electron-mobility transistors (HEMTs) have been investigated in this paper. We have identified a gate degradation using a combination of optical and electrical measurements. We have demonstrated that the channel current under the degradation position is outside of the gate's control. This degradation prevents the gate from fully pinching off the channel, creating a current concentration region when applying a reverse gate voltage. An integrated analysis, including I-V characterization, the emission microscope (EMMI) technique, and temperature-dependent measurements, was applied to study its mechanism. It is attributed to an irradiation-induced degradation in the Schottky contact.

Keyword:

gate degradation high-electron-mobility transistors (HEMTs) subthreshold current GaN Gamma irradiation

Author Community:

  • [ 1 ] [Zheng, Xiang]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 2 ] [Feng, Shiwei]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 3 ] [Li, Xuan]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 4 ] [Yang, Ying]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 5 ] [Pan, Shijie]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 6 ] [Hu, Zhaoxu]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 7 ] [Li, Xiaoyang]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 8 ] [Zhang, Yamin]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 9 ] [Peng, Chao]China Elect Prod Reliabil & Environm Testing Res, Sci & Technol Reliabil Phys & Applicat Elect Comp, Guangzhou 510610, Guangdong, Peoples R China
  • [ 10 ] [Lin, Gang]Key Lab Microwave & Millimeter Wave Monolith Inte, Nanjing 100048, Jiangsu, Peoples R China
  • [ 11 ] [Bai, Lin]Nanjing Elect Devices Inst, Nanjing 210016, Jiangsu, Peoples R China

Reprint Author's Address:

  • 冯士维

    [Feng, Shiwei]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China;;[Zhang, Yamin]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China

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Source :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

Year: 2019

Issue: 9

Volume: 66

Page: 3784-3788

3 . 1 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:136

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 11

SCOPUS Cited Count: 12

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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