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Author:

Yip, SenPo (Yip, SenPo.) | Shen, Lifan (Shen, Lifan.) | Ho, Johnny C. (Ho, Johnny C..)

Indexed by:

EI Scopus SCIE

Abstract:

The excellent properties of III-V semiconductors make them intriguing candidates for next-generation electronics and optoelectronics. Their nanowire (NW) counterparts further provide interesting geometry and a quantum confinement effect which benefits various applications. Among the many members of all the III-V semiconductors, III-antimonide NWs have attracted significant research interest due to their narrow, direct bandgap and high carrier mobility. However, due to the difficulty of NW fabrication, the development of III-antimonide NWs and their corresponding applications are always a step behind the other III-V semiconductors. Until recent years, because of advances in understanding and fabrication techniques, electronic and optoelectronic devices based on III-antimonide NWs with novel performance have been fabricated. In this review, we will focus on the development of the synthesis of III-antimonide NWs using different techniques and strategies for fine-tuning the crystal structure and composition as well as fabricating their corresponding heterostructures. With such development, the recent progress in the applications of III-antimonide NWs in electronics and optoelectronics is also surveyed. All these discussions provide valuable guidelines for the design of III-antimonide NWs for next-generation device utilization.

Keyword:

electronics synthesis nanowire optoelectronics III-antimonide

Author Community:

  • [ 1 ] [Yip, SenPo]City Univ Hong Kong, Dept Mat Sci & Engn, Hong Kong, Peoples R China
  • [ 2 ] [Shen, Lifan]City Univ Hong Kong, Dept Mat Sci & Engn, Hong Kong, Peoples R China
  • [ 3 ] [Ho, Johnny C.]City Univ Hong Kong, Dept Mat Sci & Engn, Hong Kong, Peoples R China
  • [ 4 ] [Yip, SenPo]City Univ Hong Kong, Shenzhen Res Inst, Shenzhen 518057, Peoples R China
  • [ 5 ] [Ho, Johnny C.]City Univ Hong Kong, Shenzhen Res Inst, Shenzhen 518057, Peoples R China
  • [ 6 ] [Shen, Lifan]Beijing Univ Technol, Fac Informat Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 7 ] [Shen, Lifan]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Ho, Johnny C.]City Univ Hong Kong, State Key Lab Terahertz & Millimeter Waves, Hong Kong, Peoples R China
  • [ 9 ] [Ho, Johnny C.]City Univ Hong Kong, Ctr Funct Photon, Hong Kong, Peoples R China

Reprint Author's Address:

  • [Ho, Johnny C.]City Univ Hong Kong, Dept Mat Sci & Engn, Hong Kong, Peoples R China;;[Ho, Johnny C.]City Univ Hong Kong, Shenzhen Res Inst, Shenzhen 518057, Peoples R China;;[Ho, Johnny C.]City Univ Hong Kong, State Key Lab Terahertz & Millimeter Waves, Hong Kong, Peoples R China;;[Ho, Johnny C.]City Univ Hong Kong, Ctr Funct Photon, Hong Kong, Peoples R China

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Source :

NANOTECHNOLOGY

ISSN: 0957-4484

Year: 2019

Issue: 20

Volume: 30

3 . 5 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:211

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 28

SCOPUS Cited Count: 28

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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