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Author:

Liao, Zhiheng (Liao, Zhiheng.) | Guo, Chunsheng (Guo, Chunsheng.) | Meng, Ju (Meng, Ju.) | Jiang, Boyang (Jiang, Boyang.) | Gao, Li (Gao, Li.) | Su, Ya (Su, Ya.) | Wang, Ruomin (Wang, Ruomin.) | Feng, Shiwei (Feng, Shiwei.) (Scholars:冯士维)

Indexed by:

EI Scopus SCIE

Abstract:

By using scanning electron microscopy (SEM) and infrared data, we established and verified a two-dimensional finite-element model conforming to the size of the practical device to study high-electron-mobility transistors (HEMTs). Because the resolution of the infrared measurement was 7 mu m, we verified the correctness of the model by comparing the 7-mu m average peak temperature with the measured infrared data at various platform temperatures. The simulated average peak temperature agrees well with the infrared data. To further investigate the thermal performance of GaN-based HEMTs with various layer sizes and structural parameters, we simulated devices with various values of gate length, gate spacing, GaN layer thickness, substrate breadth, and substrate thickness. The conclusions presented result from some factors that must be taken into account to manage thermal issues in devices. (C) 2017 Elsevier Ltd. All rights reserved.

Keyword:

Finite-element analysis High-electron-mobility transistors (HEMTs) Thermal simulation GaN

Author Community:

  • [ 1 ] [Liao, Zhiheng]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 2 ] [Guo, Chunsheng]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 3 ] [Meng, Ju]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 4 ] [Jiang, Boyang]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 5 ] [Su, Ya]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 6 ] [Wang, Ruomin]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 7 ] [Feng, Shiwei]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China
  • [ 8 ] [Gao, Li]China Elect Standardizat Inst, Beijing 100176, Peoples R China

Reprint Author's Address:

  • [Liao, Zhiheng]Beijing Univ Technol, Inst Semicond Device Reliabil Phys, Beijing 100124, Peoples R China

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Source :

MICROELECTRONICS RELIABILITY

ISSN: 0026-2714

Year: 2017

Volume: 74

Page: 52-57

1 . 6 0 0

JCR@2022

ESI Discipline: ENGINEERING;

ESI HC Threshold:165

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 8

SCOPUS Cited Count: 8

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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