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Author:

Yang, Weiming (Yang, Weiming.) | Shi, Chen (Shi, Chen.) | Liu, Sujuan (Liu, Sujuan.) | Chen, Jianxin (Chen, Jianxin.)

Indexed by:

EI Scopus

Abstract:

After the shortage of the conventional lateral structure of SiGe HBT was analyzed, A new lateral structure was presented. In the meantime, the new fabrication process named buried metal self-aligned technique was designed. The measured frequency features show that the cut-off frequency fT of the device up to 12.3GHz and the maximum oscillation frequency fmax achieves 5.7GHz. Compared to the conventional lateral structure and process, the values of fT and fmax SiGe HBT based on the new lateral structure and process have been increased 17% and 18.75% respectively. This indicates that the new lateral structure and buried metal self-aligned process is effective to improve the high frequency performance of SiGe HBT. © 2006 IEEE.

Keyword:

Bandwidth Heterojunction bipolar transistors Microfabrication Cutoff frequency Semiconducting silicon compounds

Author Community:

  • [ 1 ] [Yang, Weiming]School of Physics and Electronics Technology, Hubei University, Wuhan 430062, China
  • [ 2 ] [Shi, Chen]Beijing Optoelectronics Technology Laboratory, Beijing University of Technology, Beijing 100022, China
  • [ 3 ] [Liu, Sujuan]Beijing Optoelectronics Technology Laboratory, Beijing University of Technology, Beijing 100022, China
  • [ 4 ] [Chen, Jianxin]Beijing Optoelectronics Technology Laboratory, Beijing University of Technology, Beijing 100022, China

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Source :

Year: 2006

Page: 227-230

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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