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Abstract:
近年来,石墨烯材料由于优异的光电性能获得了广泛关注,并应用于发光二极管的透明电极以取代昂贵的铟锑氧化物(indium tin oxide, ITO)透明电极,但由于石墨烯与p-GaN功函数不匹配,二者很难形成好的欧姆接触,因而造成器件电流扩展差和电压高等问题.本文将ITO薄层作为石墨烯透明电极与p-Ga N间的插入层,以改善石墨烯与p-Ga N层的欧姆接触.所制备的石墨烯透明电极的方块电阻为252.6?/□,石墨烯/ITO复合透明电极的方块电阻为70.1?/□;石墨烯透明电极与p-Ga N层的比接触电阻率为1.92×10~(–2) ?cm~2,ITO插入之后,其比接触电阻率降低为1.01×10...
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Source :
物理学报
Year: 2019
Issue: 24
Volume: 68
Page: 307-311
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 10
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