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Author:

Pan, Guanzhong (Pan, Guanzhong.) | Xie, Yiyang (Xie, Yiyang.) | Xu, Chen (Xu, Chen.) (Scholars:徐晨) | Wang, Qiuhua (Wang, Qiuhua.) | Dong, Yibo (Dong, Yibo.) | Deng, Jun (Deng, Jun.) | Chen, Hongda (Chen, Hongda.) | Sun, Jie (Sun, Jie.)

Indexed by:

EI Scopus SCIE

Abstract:

Metal grids are used to solve the current spreading problem in coherently coupled implant-defined vertical cavity surface emitting laser (VCSEL) arrays. In-phase mode operation with a near-diffraction-limited beam is achieved in hexagonal 19-element arrays. The measured beamwidth of the arrays is as low as 1.3 degrees, which is only about 1.08 times of the diffraction limit. The arrays can maintain a relatively high proportion of 29.2% average power in the central lobe from threshold to maximum output power. The narrow beamwidth and high power proportion benefit from the uniform near-field optical intensity owing to the metal grids. This technique provides an alternative method to realize large-area in-phase coherently coupled VCSEL array with high beam quality.

Keyword:

Vertical cavity surface emitting lasers Optical device fabrication Metals in-phase mode Surface-emitting lasers Laser modes semiconductor laser arrays Laser beams Optical diffraction

Author Community:

  • [ 1 ] [Pan, Guanzhong]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Xie, Yiyang]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Xu, Chen]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Wang, Qiuhua]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Dong, Yibo]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 6 ] [Deng, Jun]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 7 ] [Sun, Jie]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Chen, Hongda]Chinese Acad Sci, State Key Lab Integrated Optoelect, Inst Semicond, Beijing 100083, Peoples R China

Reprint Author's Address:

  • 徐晨

    [Xie, Yiyang]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China;;[Xu, Chen]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China

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Source :

IEEE PHOTONICS TECHNOLOGY LETTERS

ISSN: 1041-1135

Year: 2019

Issue: 20

Volume: 31

Page: 1647-1649

2 . 6 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:123

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 3

SCOPUS Cited Count: 3

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 8

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